Lithography

 NameModelManufacturerResponsible group name
DetailsGammaGamma 4MSuss MicrotecIn2great Materials
DetailsBake 7Ramp ableNaberthermQLA-Nanoteknik
DetailsFH APL-gulDragskåpPM PlastQLA-Nanoteknik
DetailsKarl SussMask aligner MA8/BA8Karl SussQLA-Nanoteknik
DetailsEmmaMA6/BA6Karl SussQLA-Nanoteknik
DetailsBake 2Pre and postprocessing of samplesBake oven DespatchEKT
DetailsBake 3Pre and postprocessing of samplesBake oven MemmertEKT
DetailsMasktvättSCS 124Ultra t Equipment Company, Inc.ELAB
DetailsAPL-HMDSVacuum Bake / Vapour Prime Processing SystemYES-5E QLA-Nanoteknik
DetailsHMDS 2Star 2000 (HMDS)IMTECQLA-Nanoteknik
DetailsFH Gul3DragskåpPM PlastQLA-Nanoteknik
DetailsALS-stepperALS 2035 G-lineGCA/UltratechEKT
DetailsBake 4U 26MemmertQLA-Nanoteknik
DetailsBake 6OvenDespatchQLA-Nanoteknik
DetailsMaximusMaximus 804SSEQLA-Nanoteknik
DetailsNSR i-line stepperTFHi12NikonEKT
DetailsLabspin80Labspin8-BMSuss MicrotecQLA-Nanoteknik
DetailsULVAC photoresist stripperENVIRO-1XaULVACEKT
DetailsLabspin 82Labspin8 BMSuss MicrotecQLA-Nanoteknik