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Materials Processing/Synthesis
Materials Characterization
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KTH Resources School Wise
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Materials Processing/Synthesis
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Dry Etching
Dry Etching
Name
Model
Manufacturer
Responsible group name
Details
ICP
ICP DRIE (Si, SiO2)
STS
QLA-Nanoteknik
Details
P5000 RIE/PECVD cluster
Precision 5000 Mark II (Dielectric, MxP, CVD)
Applied Materials
EKT
Details
Esa
Plasmalab80Plus (Oxford RIE System) Chamber B
Oxford Plasma System
QLA-Nanoteknik
Details
Fabio
ICP380 Etch System
Oxford Instrument
QLA-Nanoteknik
Details
Gallus
ICP380 Etch System (GaAs & InP)
Oxford Instrument
QLA-Nanoteknik
Details
Tegal
B300RF
Plasmaline
IRnova
Details
Tepla
300 (Microwave Plasma Asher)
TePla
QLA-Nanoteknik
Details
RIE
RIE of thin films (Si3N4 & SiO2)
Plasmalab System 100
QLA-Nanoteknik
Details
Ariel
Plasmalab80Plus (Oxford RIE System)
Oxford Plasma Technology
QLA-Nanoteknik
Details
Orbis, Vapor HF etch
Orbis Alpha
memsstar
MST
Details
Mariana
Rapier
SPTS
MST